| Effects of Al Precursors on Deposition Selectivity of Atomic Layer Deposition of Al2O3 Using Ethanethiol Inhibitor HG Kim, M Kim, B Gu, MR Khan, BG Ko, S Yasmeen, CS Kim, SH Kwon, ... Chemistry of Materials 32 (20), 8921-8929, 2020 | 52 | 2020 |
| Gradient area-selective deposition for seamless gap-filling in 3D nanostructures through surface chemical reactivity control CT Nguyen, EH Cho, B Gu, S Lee, HS Kim, J Park, NK Yu, S Shin, ... Nature Communications 13 (1), 7597, 2022 | 13 | 2022 |
| Elucidating the Reaction Mechanism of Atomic Layer Deposition of Al2O3 with a Series of Al(CH3)xCl3–x and Al(CyH2y+1)3 Precursors IK Oh, TE Sandoval, TL Liu, NE Richey, CT Nguyen, B Gu, HBR Lee, ... Journal of the American Chemical Society 144 (26), 11757-11766, 2022 | 10 | 2022 |
| Atomic layer modulation of multicomponent thin films through combination of experimental and theoretical approaches CT Nguyen, B Gu, T Cheon, J Park, MR Khan, SH Kim, B Shong, ... Chemistry of Materials 33 (12), 4435-4444, 2021 | 9 | 2021 |
| Computational Modeling of Physical Surface Reactions of Precursors in Atomic Layer Deposition by Monte Carlo Simulations on a Home Desktop Computer B Gu, N Le Trinh, CT Nguyen, S Yasmeen, H Gaiji, Y Kang, HBR Lee Chemistry of Materials 34 (17), 7635-7649, 2022 | 7 | 2022 |
| Growth modulation of atomic layer deposition of HfO 2 by combinations of H 2 O and O 3 reactants BG Ko, CT Nguyen, B Gu, MR Khan, K Park, H Oh, J Park, B Shong Dalton Transactions 50 (48), 17935-17944, 2021 | 7 | 2021 |
| Area-Selective Deposition of Ruthenium Using Homometallic Precursor Inhibitor CT Nguyen, EH Cho, NL Trinh, B Gu, M Lee, S Lee, JY Lee, Y Kang, ... Chemistry of Materials 35 (14), 5331-5340, 2023 | 3 | 2023 |
| Organosulfide Inhibitor Instigated Passivation of Multiple Substrates for Area-Selective Atomic Layer Deposition of HfO2 S Zoha, F Pieck, B Gu, R Tonner-Zech, HBR Lee Chemistry of Materials, 2024 | | 2024 |
| Gradient area-selective deposition for seamless gap-filling in 3D nanostructures through surface chemical reactivity control (jan, 10.1038/s41467-023-35883-9, 2023) CT Nguyen, EH Cho, B Gu, S Lee, HS Kim, J Park, NK Yu, S Shin, ... NATURE COMMUNICATIONS 14 (1), 2023 | | 2023 |
| Publisher Correction: Gradient area-selective deposition for seamless gap-filling in 3D nanostructures through surface chemical reactivity control CT Nguyen, EH Cho, B Gu, S Lee, HS Kim, J Park, NK Yu, S Shin, ... nature communications 14, 2023 | | 2023 |
| Elucidating the Reaction Mechanism of Atomic Layer Deposition of Al₂O₃ with a Series of Al (CH₃) ₓCl₃–ₓ and Al (CyH₂y₊ ₁) ₃ Precursors IK Oh, TE Sandoval, TL Liu, NE Richey, CT Nguyen, B Gu, R Tonner-Zech, ... | | 2022 |
| Si Precursor Inhibitors for Area Selective Deposition of Ru B Gu, S Yasmeen, GH Oh, IK Oh, Y Kang, HBR Lee Available at SSRN 4712704, 0 | | |
