Iacopo Mochi
Title
Cited by
Cited by
Year
Fluorescence lidar imaging of the cathedral and baptistery of Parma
D Lognoli, G Cecchi, I Mochi, L Pantani, V Raimondi, R Chiari, ...
Applied Physics B 76 (4), 457-465, 2003
652003
Printability of native blank defects and programmed defects and their stack structures
HJ Kwon, J Harris-Jones, R Teki, A Cordes, T Nakajima, I Mochi, ...
Photomask Technology 2011 8166, 81660H, 2011
502011
Commissioning an EUV mask microscope for lithography generations reaching 8 nm
KA Goldberg, I Mochi, M Benk, AP Allezy, MR Dickinson, CW Cork, ...
Extreme Ultraviolet (EUV) Lithography IV 8679, 867919, 2013
492013
The GIANO-TNG spectrometer
E Oliva, L Origlia, C Baffa, C Biliotti, P Bruno, F D'Amato, C Del Vecchio, ...
Ground-based and Airborne Instrumentation for Astronomy 6269, 626919, 2006
482006
The GIANO spectrometer: towards its first light at the TNG
E Oliva, L Origlia, R Maiolino, C Baffa, V Biliotti, P Bruno, G Falcini, ...
Ground-based and Airborne Instrumentation for Astronomy IV 8446, 84463T, 2012
432012
Actinic imaging of native and programmed defects on a full-field mask
I Mochi, KA Goldberg, B La Fontaine, A Tchikoulaeva, C Holfeld
Extreme Ultraviolet (EUV) Lithography 7636, 76361A, 2010
432010
Modal wavefront reconstruction from its gradient
I Mochi, KA Goldberg
Applied Optics 54 (12), 3780-3785, 2015
342015
Actinic extreme ultraviolet mask inspection beyond
KA Goldberg, P Naulleau, I Mochi, EH Anderson, SB Rekawa, CD Kemp, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008
322008
GIANO-TNG spectroscopy of red supergiants in the young star cluster RSGC2
L Origlia, E Oliva, R Maiolino, A Mucciarelli, C Baffa, V Biliotti, P Bruno, ...
Astronomy & Astrophysics 560, A46, 2013
302013
Wavelength-specific reflections: A decade of extreme ultraviolet actinic mask inspection research
KA Goldberg, I Mochi
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2010
292010
A study of defects on EUV masks using blank inspection, patterned mask inspection, and wafer inspection
S Huh, L Ren, D Chan, S Wurm, K Goldberg, I Mochi, T Nakajima, ...
Extreme ultraviolet (EUV) lithography 7636, 76360K, 2010
282010
An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nm
KA Goldberg, I Mochi, SB Rekawa, NS Smith, JB Macdougall, ...
Extreme Ultraviolet (EUV) Lithography II 7969, 796910, 2011
272011
Improving the performance of the Actinic Inspection Tool with an optimized alignment procedure
I Mochi, KA Goldberg, P Naulleau, S Huh
Alternative Lithographic Technologies 7271, 727123, 2009
272009
Quantitative evaluation of mask phase defects from through-focus EUV aerial images
I Mochi, KA Goldberg, R Xie, PY Yan, K Yamazoe
Extreme Ultraviolet (EUV) Lithography II 7969, 79691X, 2011
262011
Replicated mask surface roughness effects on EUV lithographic patterning and line edge roughness
SA George, PP Naulleau, EM Gullikson, I Mochi, F Salmassi, KA Goldberg, ...
Extreme Ultraviolet (EUV) Lithography II 7969, 79690E, 2011
262011
Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks
F Brizuela, S Carbajo, A Sakdinawat, D Alessi, DH Martz, Y Wang, ...
Optics express 18 (14), 14467-14473, 2010
262010
Printability and inspectability of programmed pit defects on the masks in EUV lithography
IY Kang, HS Seo, BS Ahn, DG Lee, D Kim, S Huh, CW Koh, B Cha, ...
Extreme Ultraviolet (EUV) Lithography 7636, 76361B, 2010
252010
RESCAN: an actinic lensless microscope for defect inspection of EUV reticles
I Mochi, P Helfenstein, I Mohacsi, R Rajendran, D Kazazis, S Yoshitake, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 16 (4), 041003, 2017
242017
Extreme ultraviolet mask substrate surface roughness effects on lithographic patterning
SA George, PP Naulleau, I Mochi, F Salmassi, EM Gullikson, KA Goldberg, ...
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2010
232010
Actinic mask imaging: recent results and future directions from the SHARP EUV microscope
KA Goldberg, MP Benk, A Wojdyla, I Mochi, SB Rekawa, AP Allezy, ...
Extreme Ultraviolet (EUV) Lithography V 9048, 90480Y, 2014
222014
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Articles 1–20