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Jozefien Goossens
Jozefien Goossens
Verified email at fys.kuleuven.be
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Cited by
Year
Review of electrical characterization of ultra-shallow junctions with micro four-point probes
DH Petersen, O Hansen, TM Hansen, P Bøggild, R Lin, D Kjær, ...
Journal of Vacuum Science & Technology B 28 (1), C1C27-C1C33, 2010
642010
Experimental studies of dose retention and activation in fin field-effect-transistor-based structures
J Mody, R Duffy, P Eyben, J Goossens, A Moussa, W Polspoel, ...
Journal of Vacuum Science & Technology B 28 (1), C1H5-C1H13, 2010
572010
High depth resolution analysis of Si/SiGe multilayers with the atom probe
S Koelling, M Gilbert, J Goossens, A Hikavyy, O Richard, W Vandervorst
Applied Physics Letters 95 (14), 2009
462009
Shear properties of glycerol by interface wave laser ultrasonics
C Glorieux, K Van de Rostyne, J Goossens, G Shkerdin, W Lauriks, ...
Journal of applied physics 99 (1), 2006
342006
On the analysis of the activation mechanisms of sub-melt laser anneals
T Clarysse, J Bogdanowicz, J Goossens, A Moussa, E Rosseel, ...
Materials Science and Engineering: B 154, 24-30, 2008
302008
Laser-based surface acoustic wave dispersion spectroscopy for extraction of thicknesses, depth, and elastic parameters of a subsurface layer: Feasibility study on intermetallic …
R Salenbien, R Côte, J Goossens, P Limaye, R Labie, C Glorieux
Journal of Applied Physics 109 (9), 2011
292011
Surface acoustic wave depth profiling of a functionally graded material
J Goossens, P Leclaire, X Xu, C Glorieux, L Martinez, A Sola, C Siligardi, ...
Journal of Applied Physics 102 (5), 2007
292007
Effect of loading a plate with different liquids on the propagation of lamb-like waves studied by laser ultrasonics
X Xu, J Goossens, G Shkerdin, C Glorieux
IEEE transactions on ultrasonics, ferroelectrics, and frequency control 55 …, 2008
202008
Use of p-and n-type vapor phase doping and sub-melt laser anneal for extension junctions in sub-32 nm CMOS technology
ND Nguyen, E Rosseel, S Takeuchi, JL Everaert, L Yang, J Goossens, ...
Thin Solid Films 518 (6), S48-S52, 2010
192010
Micro-uniformity during laser anneal: metrology and physics
W Vandervorst, E Rosseel, R Lin, DH Petersen, T Clarysse, J Goossens, ...
MRS Online Proceedings Library (OPL) 1070, 1070-E01-10, 2008
122008
Shallow boron implantations in Ge and the role of the pre-amorphization depth
E Simoen, G Brouwers, A Satta, ML David, F Pailloux, B Parmentier, ...
Materials science in semiconductor processing 11 (5-6), 368-371, 2008
112008
Evolution of elastic and thermal properties during TMOS-gel formation determined by ringing bottle acoustic resonance spectroscopy, impulsive stimulated scattering …
X Xu, JJAF Cuautle, M Kouyate, NB Roozen, J Goossens, P Menon, ...
Journal of Physics D: Applied Physics 49 (8), 085502, 2016
102016
3D Gabor analysis of transient waves propagating along an AT cut quartz disk
J Goossens, C Glorieux, N Wilkie-Chancellier, CO Ehssein, S Serfaty
ultrasonics 44, e1173-e1177, 2006
102006
High precision micro-scale Hall effect characterization method using in-line micro four-point probes
DH Petersen, O Hansen, R Lin, PF Nielsen, T Clarysse, J Goossens, ...
2008 16th IEEE International Conference on Advanced Thermal Processing of …, 2008
92008
Study of the bending modes in circular quartz resonators
P Leclaire, J Goossens, L Martinez, N Wilkie-Chancelier, S Serfaty, ...
ieee transactions on ultrasonics, ferroelectrics, and frequency control 53 …, 2006
92006
Quantitative depth profiling of SiGe‐multilayers with the Atom Probe
S Koelling, M Gilbert, J Goossens, A Hikavyy, O Richard, W Vandervorst
Surface and interface analysis 43 (1‐2), 163-166, 2011
82011
Advanced 2D/3D simulations for laser annealed device using an atomistic kinetic Monte Carlo approach and Scanning Spreading Resistance Microscopy (SSRM)
T Noda, P Eyben, W Vandervorst, C Vrancken, E Rosseel, C Ortolland, ...
2008 IEEE International Electron Devices Meeting, 1-4, 2008
82008
Advanced 2D/3D simulations for laser annealed device using an atomistic kinetic Monte Carlo approach and Scanning Spreading Resistance Microscopy (SSRM)
T Noda, P Eyben, W Vandervorst, C Vrancken, E Rosseel, C Ortolland, ...
2008 IEEE International Electron Devices Meeting, 1-4, 2008
82008
Basic Aspects of the Formation and Activation of Boron Junctions Using Plasma Immersion Ion Implantation.
G Zschätzsch, W Vandervorst, T Hoffmann, J Goossens, JL Everaert, ...
AIP Conference Proceedings 1066 (1), 461-464, 2008
72008
Proceedings of the 16th IEEE International Conference on Advanced Thermal Processing of Semiconductors, RTP 2008
CL Petersen, O Hansen, R Lin, PF Nielsen, T Clarysse, J Goossens, ...
Proceedings of the 14th IEEE International Conference on Advanced Thermal …, 2006
72006
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