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Wenyu Zhang, Ph.D.
Wenyu Zhang, Ph.D.
Senior Technologist, Lam Research
Verified email at lamresearch.com
Title
Cited by
Cited by
Year
Controlling nanocrystal superlattice symmetry and shape-anisotropic interactions through variable ligand surface coverage
JJ Choi, CR Bealing, K Bian, KJ Hughes, W Zhang, DM Smilgies, ...
Journal of the American Chemical Society 133 (9), 3131-3138, 2011
2472011
Common decomposition pathways of 1-epoxy-3-butene and 2-butenal on Pd (111)
ST Marshall, CM Horiuchi, W Zhang, JW Medlin
The Journal of Physical Chemistry C 112 (51), 20406-20412, 2008
312008
Effect of substrate composition on atomic layer deposition using self-assembled monolayers as blocking layers
W Zhang, JR Engstrom
Journal of Vacuum Science & Technology A 34 (1), 2016
282016
Selective etch of metal nitride films
PM Wenyu Zhang, Liqi Wu, Shih Chung Chen, Wei Tang, Leung Kway Lee, Xinming ...
US Patent App. 15/446,573, 2017
16*2017
Aluminum content control of TiAlN films
PM Wenyu Zhang, Wei Tang, Chen-han Lin, Yixiong Yang, Yi Xu, David Thompson
US Patent App. 15/462,214, 2017
15*2017
Investigation of submonolayer SiOX species formed from oxidation of silane on Pt (1 1 1)
DC Kershner, W Zhang, JW Medlin
Surface science 602 (21), 3225-3231, 2008
142008
Multi-threshold voltage structures with a lanthanum nitride film and methods of formation thereof
WV Tang, PF Ma, SCH Hung, M Chudzik, S Krishnan, W Zhang, ...
US Patent 9,748,354, 2017
122017
Design and characterization of a microreactor for spatially confined atomic layer deposition and in situ UHV surface analysis
JR Chen, W Zhang, RK Nahm, MA DiFeo, JR Engstrom
Journal of Vacuum Science & Technology A 35 (6), 2017
82017
Methods of treating a substrate to form a layer thereon for application in selective deposition processes
JS Kachian, J Tanskanen, W Zhang, MS Jackson, C Ke, L Wu
US Patent App. 16/381,755, 2019
72019
Probing ultrathin film continuity and interface abruptness with x-ray photoelectron spectroscopy and low-energy ion scattering
W Zhang, RK Nahm, PF Ma, JR Engstrom
Journal of Vacuum Science & Technology A 31 (6), 2013
72013
Methods of reducing or eliminating defects in tungsten film
J Guoqiang, W Tang, CC Lin, PF Ma, K Wu, V Banthia, M Chang, J Ye, ...
US Patent 10,879,081, 2020
22020
Methods for selective deposition using self assembled monolayers
C Ke, W Zhang, L Wu
US Patent App. 16/535,499, 2020
22020
Methods and apparatus for doping engineering and threshold voltage tuning by integrated deposition of titanium nitride and aluminum films
Y Yang, PF Ma, WV Tang, W Zhang, SC Chen, CH Lin, CC Lin, Y Xu, ...
US Patent 10,665,450, 2020
12020
Method for forming a layer
W Wang, H Dai, CS Ngai, L Wu, W Zhang, Y Chen, H Chen, KT Wong, ...
US Patent 10,957,590, 2021
2021
Methods of increasing selectivity for selective etch processes
W Zhang, Y Yang, MD Sanchez, J Guoqiang, WV Tang, PF Ma
US Patent 10,755,947, 2020
2020
Methods to improve selectivity in preferential etch
WZ Paul Ma, Guoqiang Jian, Mario Sanchez, Wei Tang, Yixiong Yang
US Patent App. 62/665,497, 2018
2018
Reducing or eliminating Tungsten silky defects
PM Guoqiang Jian, Wei Tang, Chi-chou Lin, Wenyu Zhang, Kai Wu, Vikash ...
US Patent App. 62/590,053, 2017
2017
Multi-threshold voltage structures with a Lanthanum Nitride film and methods of formation thereof
PM Wei Tang, , Steven Hung, Michael Chudzik, Siddarth Krishnan, Wenyu Zhang ...
US Patent 09,748,354, 2017
2017
Methods and apparatus for doping engineering and threshold voltage tuning by integrated deposition of Titanium and Aluminum films
PM Wenyu Zhang, Yixiong Yang, Wei Tang, Shih Chung Chen, Chen-han Lin, Chi ...
US Patent App. 62/547,754, 2017
2017
Study Of Atomic Layer Deposition: Thin Film Continuity And Techniques To Modulate Surface Reactivity
W Zhang
2016
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