Damage by radicals and photons during plasma cleaning of porous low-k SiOCH. I. Ar/O2 and He/H2 plasmas J Shoeb, MM Wang, MJ Kushner Journal of Vacuum Science & Technology A 30 (4), 2012 | 60 | 2012 |
A fast and accurate maximum power point tracker for PV systems S Yuvarajan, J Shoeb 2008 Twenty-Third Annual IEEE Applied Power Electronics Conference and …, 2008 | 53 | 2008 |
Damage by radicals and photons during plasma cleaning of porous low-k SiOCH. II. Water uptake and change in dielectric constant J Shoeb, MJ Kushner Journal of Vacuum Science & Technology A 30 (4), 2012 | 36 | 2012 |
Mechanisms for sealing of porous low-k SiOCH by combined He and NH3 plasma treatment J Shoeb, MJ Kushner Journal of Vacuum Science & Technology A 29 (5), 2011 | 27 | 2011 |
Systems and methods for achieving peak ion energy enhancement with a low angular spread J Shoeb, Y Wu, A Paterson US Patent 10,395,894, 2019 | 21 | 2019 |
Methods and apparatuses for etch profile matching by surface kinetic model optimization MD Tetiker, S Sriraman, AD Bailey III, J Shoeb, A Paterson, RA Gottscho US Patent 10,386,828, 2019 | 21 | 2019 |
Mechanisms for plasma etching of HfO2 gate stacks with Si selectivity and photoresist trimming J Shoeb, MJ Kushner Journal of Vacuum Science & Technology A 27 (6), 1289-1302, 2009 | 20 | 2009 |
Multi-level pulsing of DC and RF signals J Shoeb, A Paterson, Y Wu US Patent 10,580,618, 2020 | 10 | 2020 |
Polymer Cleaning From Porous Low- Dielectrics in Plasmas J Shoeb, MJ Kushner IEEE Transactions on Plasma Science 39 (11), 2828-2829, 2011 | 7 | 2011 |
Multi-level parameter and frequency pulsing with a low angular spread J Shoeb, A Paterson, Y Wu US Patent 10,224,183, 2019 | 6 | 2019 |
Multi-level parameter and frequency pulsing with a low angular spread J Shoeb, A Paterson, Y Wu US Patent 10,573,494, 2020 | 4 | 2020 |
Multi-level pulsing of DC and RF signals J Shoeb, A Paterson, Y Wu US Patent 10,304,660, 2019 | 4 | 2019 |
Minimizing damage of porous SiCOH using He/H2 plasmas J Shoeb, MJ Kushner 2011 Abstracts IEEE International Conference on Plasma Science, 1-1, 2011 | 2 | 2011 |
Pulsing rf coils of a plasma chamber in reverse synchronization J Shoeb, TA Kamp, AM Paterson US Patent App. 18/015,708, 2023 | 1 | 2023 |
Multi-level parameter and frequency pulsing with a low angular spread J Shoeb, A Paterson, Y Wu US Patent 11,462,390, 2022 | 1 | 2022 |
Etching isolation features and dense features within a substrate J Shoeb, AM Paterson, Y Wu US Patent 11,398,387, 2022 | 1 | 2022 |
Multi-level parameter and frequency pulsing with a low angular spread J Shoeb, A Paterson, Y Wu | 1 | 2019 |
Comparison Of Cleaning And Damage Of Porous Low-k SiCOH In Ar/O 2 And He/H 2 Plasmas With UV/VUV Fluxes J Shoeb, MJ Kushner Ispc 20, 2-5, 2011 | 1 | 2011 |
SYSTEMS AND METHODS FOR ACHIEVING PEAK ION ENERGY ENHANCEMENT WITH A LOW ANGULAR SPREAD J Shoeb, Y Wu, A Paterson US Patent App. 18/420,737, 2024 | | 2024 |
Systems and methods for achieving peak ion energy enhancement with a low angular spread J Shoeb, Y Wu, A Paterson US Patent 11,915,912, 2024 | | 2024 |