| Quantifying defects in graphene via Raman spectroscopy at different excitation energies LG Cançado, A Jorio, EHM Ferreira, F Stavale, CA Achete, RB Capaz, ... Nano letters 11 (8), 3190-3196, 2011 | 3521 | 2011 |
| Quantifying defects in graphene via Raman spectroscopy at different excitation energies LG Cançado, A Jorio, EHM Ferreira, F Stavale, CA Achete, RB Capaz, ... Nano letters 11 (8), 3190-3196, 2011 | 3521 | 2011 |
| Inkjet-printed graphene electronics F Torrisi, T Hasan, W Wu, Z Sun, A Lombardo, TS Kulmala, GW Hsieh, ... Acs Nano 6 (4), 2992-3006, 2012 | 1355 | 2012 |
| 2 μm solid-state laser mode-locked by single-layer graphene AA Lagatsky, Z Sun, TS Kulmala, RS Sundaram, S Milana, F Torrisi, ... Applied Physics Letters 102 (1), 013113, 2013 | 161 | 2013 |
| Ultrafast and widely tuneable vertical-external-cavity surface-emitting laser, mode-locked by a graphene-integrated distributed Bragg reflector CA Zaugg, Z Sun, VJ Wittwer, D Popa, S Milana, TS Kulmala, ... Optics express 21 (25), 31548-31559, 2013 | 144 | 2013 |
| Carbon nanotube thin film transistors based on aerosol methods MY Zavodchikova, T Kulmala, AG Nasibulin, V Ermolov, S Franssila, ... Nanotechnology 20 (8), 085201, 2009 | 68 | 2009 |
| Transport conductivity of graphene at RF and microwave frequencies SA Awan, A Lombardo, A Colli, G Privitera, TS Kulmala, JM Kivioja, ... 2D Materials 3 (1), 015010, 2016 | 60 | 2016 |
| Platinum and palladium oxalates: positive-tone extreme ultraviolet resists M Sortland, J Hotalen, RD Re, J Passarelli, M Murphy, TS Kulmala, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (4), 043511-043511, 2015 | 45 | 2015 |
| SnO x high-efficiency EUV interference lithography gratings towards the ultimate resolution in photolithography E Buitrago, R Fallica, D Fan, TS Kulmala, M Vockenhuber, Y Ekinci Microelectronic Engineering 155, 44-49, 2016 | 42 | 2016 |
| Graphene-based MIM diode and associated methods A Colli, SA Awan, A Lombardo, TJ Echtermeyer, TS Kulmala, AC Ferrari US Patent 9,202,945, 2015 | 22 | 2015 |
| Graphene-based MIM diode and associated methods A Colli, SA Awan, A Lombardo, TJ Echtermeyer, TS Kulmala, AC Ferrari US Patent 9,202,945, 2015 | 22 | 2015 |
| EUV lithography process challenges E Buitrago, TS Kulmala, R Fallica, Y Ekinci Frontiers of Nanoscience 11, 135-176, 2016 | 21 | 2016 |
| Novel carbon nanotube network deposition technique for electronic device fabrication MY Zavodchikova, AG Nasibulin, T Kulmala, K Grigoras, AS Anisimov, ... physica status solidi (b) 245 (10), 2272-2275, 2008 | 18 | 2008 |
| Self-aligned coupled nanowire transistor TS Kulmala, A Colli, A Fasoli, A Lombardo, S Haque, AC Ferrari ACS nano 5 (9), 6910-6915, 2011 | 12 | 2011 |
| Single-nanometer accurate 3D nanoimprint lithography with master templates fabricated by NanoFrazor lithography TS Kulmala, CD Rawlings, M Spieser, T Glinsner, A Schleunitz, ... Novel Patterning Technologies 2018 10584, 209-216, 2018 | 11 | 2018 |
| Toward 10 nm half-pitch in extreme ultraviolet lithography: results on resist screening and pattern collapse mitigation techniques TS Kulmala, M Vockenhuber, E Buitrago, R Fallica, Y Ekinci Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (3), 033507-033507, 2015 | 11 | 2015 |
| Toward 10nm half-pitch in EUV lithography: results on resist screening and pattern collapse mitigation techniques TS Kulmala, M Vockenhuber, E Buitrago, R Fallica, Y Ekinci Extreme Ultraviolet (EUV) Lithography VI 9422, 942204, 2015 | 11 | 2015 |
| Wavelength tunable graphene modelocked VECSEL CA Zaugg, Z Sun, D Popa, S Milana, T Kulmala, RS Sundaram, ... CLEO: Science and Innovations, CW1G. 4, 2013 | 8 | 2013 |
| High throughput lithography using thermal scanning probes C Rawlings, M Spieser, C Schwemmer, TS Kulmala, YKR Cho, S Bonanni, ... 2017 19th International Conference on Solid-State Sensors, Actuators and …, 2017 | 6 | 2017 |
| Pattern collapse mitigation in inorganic resists via a polymer freeze technique TS Kulmala, E Buitrago, M Vockenhuber, Y Ekinci Microelectronic Engineering 155, 39-43, 2016 | 6 | 2016 |
