| Automated sample plan selection for OPC modeling N Casati, M Gabrani, R Viswanathan, Z Bayraktar, O Jaiswal, D DeMaris, ... Optical Microlithography XXVII 9052, 131-142, 2014 | 7 | 2014 |
| Experiments using automated sample plan selection for OPC modeling R Viswanathan, O Jaiswal, N Casati, A Abdo, J Oberschmidt, J Watts, ... Optical Microlithography XXVIII 9426, 228-237, 2015 | 4 | 2015 |
| Electrical validation of through-process optical proximity correction verification limits O Jaiswal, R Kuncha, T Bharat, V Madangarli, E Conrad, J Bruce, ... Journal of Micro/Nanolithography, MEMS and MOEMS 9 (4), 041303-041303-6, 2010 | 3 | 2010 |
| Evaluation of process variations on OPC model predictions J Oberschmidt, S Barai, T Desouky, OP Jaiswal, A Padmawar, ... Photomask and Next-Generation Lithography Mask Technology XVIII 8081, 140-149, 2011 | 1 | 2011 |
| Electrical validation of through process OPC verification limits O Jaiswal, R Kuncha, T Bharat, V Madangarli, E Conrad, J Bruce, ... Metrology, Inspection, and Process Control for Microlithography XXIV 7638 …, 2010 | | 2010 |
