Edmund Schuengel
Edmund Schuengel
Evatec AG
Verified email at evatecnet.com
TitleCited byYear
FAST TRACK COMMUNICATION: The electrical asymmetry effect in capacitively coupled radio frequency discharges-measurements of dc self bias, ion energy and ion flux
J Schulze, E Schüngel, U Czarnetzki
Journal of Physics D Applied Physics 42 (9), 2009
126*2009
The electrical asymmetry effect in capacitively coupled radio frequency discharges–measurements of dc self bias, ion energy and ion flux
J Schulze, E Schüngel, U Czarnetzki
Journal of Physics D: Applied Physics 42 (9), 092005, 2009
1262009
The electrical asymmetry effect in capacitively coupled radio-frequency discharges
U Czarnetzki, J Schulze, E Schüngel, Z Donkó
Plasma Sources Science and Technology 20 (2), 024010, 2011
116*2011
Possibilities of determining non-Maxwellian EEDFs from the OES line-ratios in low-pressure capacitive and inductive plasmas containing argon and krypton
XM Zhu, YK Pu, Y Celik, S Siepa, E Schüngel, D Luggenhölscher, ...
Plasma Sources Science and Technology 21 (2), 024003, 2012
95*2012
Phase resolved optical emission spectroscopy: a non-intrusive diagnostic to study electron dynamics in capacitive radio frequency discharges
J Schulze, E Schüngel, Z Donkó, D Luggenhölscher, U Czarnetzki
Journal of Physics D: Applied Physics 43 (12), 124016, 2010
762010
Fundamental investigations of capacitive radio frequency plasmas: simulations and experiments
Z Donkó, J Schulze, U Czarnetzki, A Derzsi, P Hartmann, I Korolov, ...
Plasma Physics and Controlled Fusion 54 (12), 124003, 2012
642012
Optimization of the electrical asymmetry effect in dual-frequency capacitively coupled radio frequency discharges: Experiment, simulation, and model
J Schulze, E Schüngel, U Czarnetzki, Z Donkó
Journal of Applied Physics 106 (6), 063307, 2009
642009
The effect of secondary electrons on the separate control of ion energy and flux in dual-frequency capacitively coupled radio frequency discharges
Z Donkó, J Schulze, P Hartmann, I Korolov, U Czarnetzki, E Schüngel
Applied Physics Letters 97 (8), 081501, 2010
612010
Effects of fast atoms and energy-dependent secondary electron emission yields in PIC/MCC simulations of capacitively coupled plasmas
A Derzsi, I Korolov, E Schüngel, Z Donkó, J Schulze
Plasma Sources Science and Technology 24 (3), 034002, 2015
55*2015
The electrical asymmetry effect in multi-frequency capacitively coupled radio frequency discharges
J Schulze, E Schüngel, Z Donkó, U Czarnetzki
Plasma Sources Science and Technology 20 (1), 015017, 2011
542011
Control of plasma properties in capacitively coupled oxygen discharges via the electrical asymmetry effect
E Schüngel, QZ Zhang, S Iwashita, J Schulze, LJ Hou, YN Wang, ...
Journal of Physics D: Applied Physics 44 (28), 285205, 2011
482011
Coupling effects in inductive discharges with radio frequency substrate biasing
J Schulze, E Schüngel, U Czarnetzki
Applied Physics Letters 100 (2), 024102, 2012
442012
The effect of dust on electron heating and dc self-bias in hydrogen diluted silane discharges
E Schüngel, S Mohr, S Iwashita, J Schulze, U Czarnetzki
Journal of Physics D: Applied Physics 46 (17), 175205, 2013
422013
Making a geometrically asymmetric capacitive rf discharge electrically symmetric
J Schulze, E Schüngel, U Czarnetzki, M Gebhardt, RP Brinkmann, ...
Applied Physics Letters 98 (3), 031501, 2011
402011
Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas: comparison of Ar, H2 and CF4
B Bruneau, T Lafleur, T Gans, D O’Connell, A Greb, I Korolov, A Derzsi, ...
Plasma Sources Science and Technology 25 (1), 01LT02, 2015
392015
Secondary electrons in dual-frequency capacitive radio frequency discharges
J Schulze, Z Donkó, E Schüngel, U Czarnetzki
Plasma Sources Science and Technology 20 (4), 045007, 2011
392011
The effect of the driving frequency on the confinement of beam electrons and plasma density in low-pressure capacitive discharges
S Wilczek, J Trieschmann, J Schulze, E Schuengel, RP Brinkmann, ...
Plasma Sources Science and Technology 24 (2), 024002, 2015
372015
Charge dynamics in capacitively coupled radio frequency discharges
J Schulze, E Schüngel, Z Donkó, U Czarnetzki
Journal of Physics D: Applied Physics 43 (22), 225201, 2010
362010
Deposition of microcrystalline intrinsic silicon by the electrical asymmetry effect technique
D Hrunski, F Mootz, A Zeuner, A Janssen, H Rost, R Beckmann, S Binder, ...
Vacuum 87, 114-118, 2013
342013
The electrical asymmetry effect in geometrically asymmetric capacitive radio frequency plasmas
E Schüngel, D Eremin, J Schulze, T Mussenbrock, U Czarnetzki
Journal of Applied Physics 112 (5), 053302, 2012
342012
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