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Nyan Aung
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Importance of interface roughness induced intersubband scattering in mid-infrared quantum cascade lasers
YT Chiu, Y Dikmelik, PQ Liu, NL Aung, JB Khurgin, CF Gmachl
Applied Physics Letters 101 (17), 2012
732012
High power spiral cavity quantum cascade superluminescent emitter
MC Zheng, NL Aung, A Basak, PQ Liu, X Wang, JY Fan, M Troccoli, ...
Optics Express 23 (3), 2713-2719, 2015
302015
Threshold current reduction and directional emission of deformed microdisk lasers via spatially selective electrical pumping
NL Aung, L Ge, O Malik, HE Türeci, CF Gmachl
Applied Physics Letters 107 (15), 2015
192015
High peak power (≥ 10 mW) quantum cascade superluminescent emitter
NL Aung, Z Yu, Y Yu, PQ Liu, X Wang, JY Fan, M Troccoli, CF Gmachl
Applied Physics Letters 105 (22), 2014
152014
Analysis of wafer heating in 14nm DUV layers
L Subramany, WJ Chung, P Samudrala, H Gao, N Aung, JM Gomez, ...
Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016
112016
Overlay control for 7nm technology node and beyond
N Aung, WJ Chung, P Samudrala, H Gao, W Gao, D Brown, G He, B Park, ...
Optical Microlithography XXXI 10587, 62-73, 2018
102018
Suppression of pointing instability in quantum cascade lasers by transverse mode control
PM Bouzi, PQ Liu, N Aung, X Wang, JY Fan, M Troccoli, CF Gmachl
Applied Physics Letters 102 (12), 2013
72013
Advanced overlay: sampling and modeling for optimized run-to-run control
L Subramany, WJ Chung, P Samudrala, H Gao, N Aung, JM Gomez, ...
Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016
42016
Comparison study of diffraction based overlay and image based overlay measurements on programmed overlay errors
H Gao, WJ Chung, N Aung, L Subramany, P Samudrala, JM Gomez
Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016
32016
Overlay optimization for 1x node technology and beyond via rule based sparse sampling
NL Aung, WJ Chung, L Subramany, S Hussain, P Samudrala, H Gao, ...
Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016
32016
Novel methodology to optimize wafer alignment to enhance 14nm on product overlay
P Samudrala, WJ Chung, L Subramany, H Gao, N Aung, SC Oh, S Lee, ...
Optical Microlithography XXX 10147, 530-535, 2017
22017
Effect of surface defects on InGaAs/InAlAs Quantum Cascade mesa current–voltage characteristics
NL Aung, X Huang, WO Charles, N Yao, CF Gmachl
Journal of crystal growth 353 (1), 35-38, 2012
22012
Intra-pulse modal instability and beam steering in quantum cascade laser
Y Yao, PM Bouzi, NL Aung, PQ Liu, Y Huang, C Gmachl, X Wang
2012 Lester Eastman Conference on High Performance Devices (LEC), 1-4, 2012
22012
Alignment solutions on FBEOL layers using ASML scanners: AEPM: Advanced equipment processes and materials
P Samudrala, G Hart, YJ Chen, L Subramany, H Gao, N Aung, WJ Chung, ...
2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2018
12018
Alignment solutions on FBEOL layers using ASML scanners
P Samudrala, G Hart, YJ Chen, L Subramany, H Gao, N Aung, WJ Chung, ...
Optical Microlithography XXX 10147, 523-529, 2017
12017
Hybrid Mid-IR OCT system for imaging and spectroscopy using New high power low-coherence quantum cascade superluminescent emitters
D Varnell, MC Zheng, N Aung, A Musse, S Lee, C Gmachl
2015 Conference on Lasers and Electro-Optics (CLEO), 1-2, 2015
12015
Semiconductor Laser Cavity Engineering for Coherent and Low-coherence Light Emission
NL Aung
Princeton University, 2015
12015
Transverse mode control in quantum cascade lasers via lossy lateral constrictions
PM Bouzi, PQ Liu, N Aung, X Wang, JY Fan, M Troccoli, CF Gmachl
Novel In-Plane Semiconductor Lasers XII 8640, 257-262, 2013
12013
High peak power quantum cascade superluminescent emitter
C Gmachl, NL Aung, MC Zheng
US Patent App. 14/974,870, 2016
2016
Scanner baseliner monitoring and control in high volume manufacturing
P Samudrala, WJ Chung, N Aung, L Subramany, H Gao, JM Gomez
Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016
2016
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