| The 2022 Plasma Roadmap: low temperature plasma science and technology I Adamovich, S Agarwal, E Ahedo, LL Alves, S Baalrud, N Babaeva, ... Journal of Physics D: Applied Physics 55 (37), 373001, 2022 | 192 | 2022 |
| Electron dynamics in low pressure capacitively coupled radio frequency discharges S Wilczek, J Schulze, RP Brinkmann, Z Donkó, J Trieschmann, ... Journal of Applied Physics 127 (18), 2020 | 96 | 2020 |
| The effect of the driving frequency on the confinement of beam electrons and plasma density in low-pressure capacitive discharges S Wilczek, J Trieschmann, J Schulze, E Schuengel, RP Brinkmann, ... Plasma Sources Science and Technology 24 (2), 024002, 2015 | 91 | 2015 |
| Kinetic interpretation of resonance phenomena in low pressure capacitively coupled radio frequency plasmas S Wilczek, J Trieschmann, D Eremin, RP Brinkmann, J Schulze, ... Physics of Plasmas 23 (6), 2016 | 78 | 2016 |
| The effect of realistic heavy particle induced secondary electron emission coefficients on the electron power absorption dynamics in single-and dual-frequency capacitively … M Daksha, A Derzsi, S Wilczek, J Trieschmann, T Mussenbrock, ... Plasma Sources Science and Technology 26 (8), 085006, 2017 | 51 | 2017 |
| Ion energy distribution functions behind the sheaths of magnetized and non-magnetized radio frequency discharges J Trieschmann, M Shihab, D Szeremley, S Gallian, D Eremin, ... Journal of Physics D: Applied Physics 46 (8), 084016, 2013 | 51 | 2013 |
| Plasma polymerization at different positions in an asymmetric ethylene discharge J Trieschmann, D Hegemann Journal of Physics D: Applied Physics 44 (47), 475201, 2011 | 36 | 2011 |
| Machine learning plasma-surface interface for coupling sputtering and gas-phase transport simulations F Krüger, T Gergs, J Trieschmann Plasma Sources Science and Technology 28 (3), 035002, 2019 | 35 | 2019 |
| Disparity between current and voltage driven capacitively coupled radio frequency discharges S Wilczek, J Trieschmann, J Schulze, Z Donko, RP Brinkmann, ... Plasma Sources Science and Technology 27 (12), 125010, 2018 | 34 | 2018 |
| Kinetic simulation of filament growth dynamics in memristive electrochemical metallization devices S Dirkmann, M Ziegler, M Hansen, H Kohlstedt, J Trieschmann, ... Journal of Applied Physics 118 (21), 2015 | 32 | 2015 |
| Multi frequency matching for voltage waveform tailoring F Schmidt, J Schulze, E Johnson, JP Booth, D Keil, DM French, ... Plasma Sources Science and Technology 27 (9), 095012, 2018 | 29 | 2018 |
| 2022 review of data-driven plasma science R Anirudh, R Archibald, MS Asif, MM Becker, S Benkadda, PT Bremer, ... IEEE Transactions on Plasma Science, 2023 | 28 | 2023 |
| On the physics of a large CCP discharge D Eremin, S Bienholz, D Szeremley, J Trieschmann, S Ries, P Awakowicz, ... Plasma Sources Science and Technology 25 (2), 025020, 2016 | 26 | 2016 |
| Continuum and kinetic simulations of the neutral gas flow in an industrial physical vapor deposition reactor K Bobzin, RP Brinkmann, T Mussenbrock, N Bagcivan, RH Brugnara, ... Surface and Coatings Technology 237, 176-181, 2013 | 25 | 2013 |
| The influence of the relative phase between the driving voltages on electron heating in asymmetric dual frequency capacitive discharges D Ziegler, J Trieschmann, T Mussenbrock, RP Brinkmann, J Schulze, ... Plasma Sources Science and Technology 19 (4), 045001, 2010 | 25 | 2010 |
| Transport of sputtered particles in capacitive sputter sources J Trieschmann, T Mussenbrock Journal of Applied Physics 118 (3), 2015 | 23 | 2015 |
| Experimental retrieval of the kinetic parameters of a dye in a solid film J Trieschmann, S Xiao, LJ Prokopeva, VP Drachev, AV Kildishev Optics Express 19 (19), 18253-18259, 2011 | 22 | 2011 |
| Analytic model of the energy distribution function for highly energetic electrons in magnetron plasmas S Gallian, J Trieschmann, T Mussenbrock, RP Brinkmann, WNG Hitchon Journal of Applied Physics 117 (2), 2015 | 20 | 2015 |
| Consistent simulation of capacitive radio-frequency discharges and external matching networks F Schmidt, T Mussenbrock, J Trieschmann Plasma Sources Science and Technology 27 (10), 105017, 2018 | 18 | 2018 |
| Correlation between sputter deposition parameters and IV characteristics in double-barrier memristive devices F Zahari, F Schlichting, J Strobel, S Dirkmann, J Cipo, S Gauter, ... Journal of Vacuum Science & Technology B 37 (6), 2019 | 17 | 2019 |
Thomas MussenbrockRuhr University Bochum, Chair of Applied Electrodynamics and Plasma Technology (AEPT)Verified email at rub.de
