Daniel Fan
Daniel Fan
Unknown affiliation
Verified email at tudelft.nl
Cited by
Cited by
Broadband interference lithography at extreme ultraviolet and soft x-ray wavelengths
N Mojarad, D Fan, J Gobrecht, Y Ekinci
Optics Letters 39 (8), 2286-2289, 2014
SnOx high-efficiency EUV interference lithography gratings towards the ultimate resolution in photolithography
E Buitrago, R Fallica, D Fan, TS Kulmala, M Vockenhuber, Y Ekinci
Microelectronic Engineering 155, 44-49, 2016
Effect of the pn junction engineering on Si microwire‐array solar cells
A Dalmau Mallorquí, FM Epple, D Fan, O Demichel, ...
physica status solidi (a) 209 (8), 1588-1591, 2012
Nickel electroplating for high-resolution nanostructures
K Hili, D Fan, VA Guzenko, Y Ekinci
Microelectronic Engineering 141, 122-128, 2015
Strain and thermal conductivity in ultrathin suspended silicon nanowires
D Fan, H Sigg, R Spolenak, Y Ekinci
Physical Review B 96 (11), 115307, 2017
Patterning of nanodot-arrays using EUV achromatic Talbot lithography at the Swiss Light Source and Shanghai Synchrotron Radiation Facility
D Fan, E Buitrago, S Yang, W Karim, Y Wu, R Tai, Y Ekinci
Microelectronic Engineering 155, 55-60, 2016
Photolithography reaches 6 nm half-pitch using EUV light
D Fan, Y Ekinci
Extreme Ultraviolet (EUV) Lithography VII 9776, 97761V, 2016
EUV resists towards 11nm half-pitch
Y Ekinci, M Vockenhuber, N Mojarad, D Fan
Extreme Ultraviolet (EUV) Lithography V 9048, 904804, 2014
Fabrication of ultrahigh resolution metal nanowires and nanodots through EUV interference lithography
J Huang, D Fan, Y Ekinci, C Padeste
Microelectronic Engineering 141, 32-36, 2015
Nanolithography using Bessel beams of extreme ultraviolet wavelength
D Fan, L Wang, Y Ekinci
Scientific Reports 6, 31301, 2016
All-dielectric metasurface-based roll-angle sensor
X Chen, Z Tao, C Chen, C Wang, L Wang, H Jiang, D Fan, Y Ekinci, S Liu
Sensors and Actuators A: Physical 279, 509-517, 2018
Facile fabrication of high-resolution extreme ultraviolet interference lithography grating masks using footing strategy during electron beam writing
L Wang, D Fan, VA Guzenko, Y Ekinci
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2013
Engineered 3D Polymer and Hydrogel Microenvironments for Cell Culture Applications
D Fan, U Staufer, A Accardo
Bioengineering 6 (4), 113, 2019
Photolithography reaches 6 nm half-pitch using extreme ultraviolet light
D Fan, Y Ekinci
Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (3), 033505, 2016
From powerful research platform for industrial EUV photoresist development, to world record resolution by photolithography: EUV interference lithography at the Paul Scherrer …
E Buitrago, R Fallica, D Fan, W Karim, M Vockenhuber, JA van Bokhoven, ...
UV and Higher Energy Photonics: From Materials to Applications 9926, 99260T, 2016
3D Printing of Large Areas of Highly Ordered Submicron Patterns for Modulating Cell Behavior
M Nouri-Goushki, MJ Mirzaali, L Angeloni, D Fan, M Minneboo, ...
ACS Applied Materials & Interfaces 12 (1), 200-208, 2019
Evidence for carbon clusters present near thermal gate oxides affecting the electronic band structure in SiC-MOSFET
D Dutta, DS De, D Fan, S Roy, G Alfieri, M Camarda, M Amsler, ...
Applied Physics Letters 115 (10), 101601, 2019
Ultra-dense silicon nanowires using extreme ultraviolet interference lithography
D Fan, H Sigg, J Gobrecht, Y Ekinci, R Spolenak
2014 International Conference on Manipulation, Manufacturing and Measurement …, 2014
Extreme‐UV interference lithography at the Paul Scherrer Institute
E Buitrago, R Fallica, D Fan, W Karim, M Vockenhuber, J van Bokhoven, ...
SPIE Newsroom, 2016
Design of Optical Micromachines for Use in Biologically Relevant Environments*
PK Andrew, D Fan, A Raudsepp, M Lofroth, U Staufer, MAK Williams, ...
2020 IEEE/ASME International Conference on Advanced Intelligent Mechatronics …, 2020
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