Daniel Fan
Title
Cited by
Cited by
Year
Broadband interference lithography at extreme ultraviolet and soft x-ray wavelengths
N Mojarad, D Fan, J Gobrecht, Y Ekinci
Optics Letters 39 (8), 2286-2289, 2014
402014
Photolithography reaches 6 nm half-pitch using extreme ultraviolet light
D Fan, Y Ekinci
Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (3), 033505, 2016
39*2016
SnOx high-efficiency EUV interference lithography gratings towards the ultimate resolution in photolithography
E Buitrago, R Fallica, D Fan, TS Kulmala, M Vockenhuber, Y Ekinci
Microelectronic Engineering 155, 44-49, 2016
342016
Effect of the pn junction engineering on Si microwire‐array solar cells
A Dalmau Mallorquí, FM Epple, D Fan, O Demichel, ...
physica status solidi (a) 209 (8), 1588-1591, 2012
322012
Strain and thermal conductivity in ultrathin suspended silicon nanowires
D Fan, H Sigg, R Spolenak, Y Ekinci
Physical Review B 96 (11), 115307, 2017
272017
Nickel electroplating for high-resolution nanostructures
K Hili, D Fan, VA Guzenko, Y Ekinci
Microelectronic Engineering 141, 122-128, 2015
272015
Engineered 3D polymer and hydrogel microenvironments for cell culture applications
D Fan, U Staufer, A Accardo
Bioengineering 6 (4), 113, 2019
232019
Patterning of nanodot-arrays using EUV achromatic Talbot lithography at the Swiss Light Source and Shanghai Synchrotron Radiation Facility
D Fan, E Buitrago, S Yang, W Karim, Y Wu, R Tai, Y Ekinci
Microelectronic Engineering 155, 55-60, 2016
182016
EUV resists towards 11nm half-pitch
Y Ekinci, M Vockenhuber, N Mojarad, D Fan
Extreme Ultraviolet (EUV) Lithography V 9048, 904804, 2014
132014
Nanolithography using Bessel beams of extreme ultraviolet wavelength
D Fan, L Wang, Y Ekinci
Scientific reports 6 (1), 1-8, 2016
122016
Fabrication of ultrahigh resolution metal nanowires and nanodots through EUV interference lithography
J Huang, D Fan, Y Ekinci, C Padeste
Microelectronic Engineering 141, 32-36, 2015
122015
3d printing of large areas of highly ordered submicron patterns for modulating cell behavior
M Nouri-Goushki, MJ Mirzaali, L Angeloni, D Fan, M Minneboo, ...
ACS applied materials & interfaces 12 (1), 200-208, 2019
102019
All-dielectric metasurface-based roll-angle sensor
X Chen, Z Tao, C Chen, C Wang, L Wang, H Jiang, D Fan, Y Ekinci, S Liu
Sensors and Actuators A: Physical 279, 509-517, 2018
102018
Evidence for carbon clusters present near thermal gate oxides affecting the electronic band structure in SiC-MOSFET
D Dutta, DS De, D Fan, S Roy, G Alfieri, M Camarda, M Amsler, ...
Applied Physics Letters 115 (10), 101601, 2019
82019
Facile fabrication of high-resolution extreme ultraviolet interference lithography grating masks using footing strategy during electron beam writing
L Wang, D Fan, VA Guzenko, Y Ekinci
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2013
72013
From powerful research platform for industrial EUV photoresist development, to world record resolution by photolithography: EUV interference lithography at the Paul Scherrer …
E Buitrago, R Fallica, D Fan, W Karim, M Vockenhuber, JA van Bokhoven, ...
UV and Higher Energy Photonics: From Materials to Applications 9926, 99260T, 2016
32016
Fabrication of a microfluidic device by using two-photon lithography on a positive photoresist
G van der Velden, D Fan, U Staufer
Micro and Nano Engineering 7, 100054, 2020
22020
Emergent collective organization of bone cells in complex curvature fields
S Callens, D Fan, I van Hengel, M Minneboo, L Fratila-Apachitei, ...
bioRxiv, 2020
22020
Ultra-dense silicon nanowires using extreme ultraviolet interference lithography
D Fan, H Sigg, J Gobrecht, Y Ekinci, R Spolenak
2014 International Conference on Manipulation, Manufacturing and Measurement …, 2014
22014
Design of Optical Micromachines for Use in Biologically Relevant Environments*
PK Andrew, D Fan, A Raudsepp, M Lofroth, U Staufer, MAK Williams, ...
2020 IEEE/ASME International Conference on Advanced Intelligent Mechatronics …, 2020
12020
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