Patrick Helfenstein
Patrick Helfenstein
Paul Scherrer Institut
Verified email at alumni.ethz.ch
Title
Cited by
Cited by
Year
Highly collimated electron beams from double-gate field emitter arrays with large collimation gate apertures
P Helfenstein, E Kirk, K Jefimovs, T Vogel, C Escher, HW Fink, S Tsujino
Applied Physics Letters 98 (6), 061502, 2011
342011
Electron beam collimation with a 40 000 tip metallic double-gate field emitter array and in-situ control of nanotip sharpness distribution
P Helfenstein, VA Guzenko, HW Fink, S Tsujino
Journal of Applied Physics 113 (4), 043306, 2013
282013
RESCAN: an actinic lensless microscope for defect inspection of EUV reticles
I Mochi, P Helfenstein, I Mohacsi, R Rajendran, D Kazazis, S Yoshitake, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 16 (4), 041003, 2017
242017
Collimated field emission beams from metal double-gate nanotip arrays optically excited via surface plasmon resonance
P Helfenstein, A Mustonen, T Feurer, S Tsujino
Applied Physics Express 6 (11), 114301, 2013
212013
Scanning coherent diffractive imaging methods for actinic extreme ultraviolet mask metrology
P Helfenstein, I Mohacsi, R Rajeev, Y Ekinci
Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (3), 034006, 2016
192016
Field-emission characteristics of molded molybdenum nanotip arrays with stacked collimation gate electrodes
S Tsujino, P Helfenstein, E Kirk, T Vogel, C Escher, HW Fink
IEEE electron device letters 31 (9), 1059-1061, 2010
192010
Fabrication of metallic double-gate field emitter arrays and their electron beam collimation characteristics
P Helfenstein, K Jefimovs, E Kirk, C Escher, HW Fink, S Tsujino
Journal of Applied Physics 112 (9), 093307, 2012
182012
Beam drift and partial probe coherence effects in EUV reflective-mode coherent diffractive imaging
P Helfenstein, R Rajeev, I Mochi, A Kleibert, CAF Vaz, Y Ekinci
Optics express 26 (9), 12242-12256, 2018
172018
Towards a stand-alone high-throughput EUV actinic photomask inspection tool: RESCAN
R Rajendran, I Mochi, P Helfenstein, I Mohacsi, S Redford, A Mozzanica, ...
Metrology, Inspection, and Process Control for Microlithography XXXI 10145 …, 2017
162017
High-density large-scale field emitter arrays for X-ray free electron laser cathodes
VA Guzenko, A Mustonen, P Helfenstein, E Kirk, S Tsujino
Microelectronic engineering 111, 114-117, 2013
152013
Scanning scattering contrast microscopy for actinic EUV mask inspection
I Mohacsi, P Helfenstein, R Rajendran, Y Ekinci
Metrology, Inspection, and Process Control for Microlithography XXX 9778, 97781O, 2016
132016
Actinic inspection of EUV reticles with arbitrary pattern design
I Mochi, P Helfenstein, R Rajeev, S Fernandez, D Kazazis, S Yoshitake, ...
International Conference on Extreme Ultraviolet Lithography 2017 10450, 1045007, 2017
112017
Scanning coherent scattering methods for actinic EUV mask inspection
Y Ekinci, P Helfenstein, R Rajeev, I Mochi, I Mohacsi, J Gobrecht, ...
Photomask Technology 2016 9985, 99851P, 2016
72016
Absorber and phase defect inspection on EUV reticles using RESCAN
I Mochi, S Fernandez, R Nebling, U Locans, P Helfenstein, R Rajeev, ...
Extreme Ultraviolet (EUV) Lithography X 10957, 109570W, 2019
62019
Experimental evaluation of the impact of EUV pellicles on reticle imaging
I Mochi, M Timmermans, E Gallagher, MM Juste, I Pollentier, R Rajeev, ...
Photomask Technology 2018 10810, 108100Y, 2018
62018
Experimental evaluation of the impact of carbon nanotube euv pellicles on reticle imaging
I Mochi, MY Timmermans, EE Gallagher, M Mariano, I Pollentier, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 18 (1), 014002, 2019
52019
Through-pellicle inspection of EUV masks
I Mochi, R Rajeev, P Helfenstein, S Fernandez, D Kazazis, Y Ekinci
Extreme Ultraviolet (EUV) Lithography IX 10583, 105831I, 2018
52018
Coherent diffractive imaging methods for semiconductor manufacturing
P Helfenstein, I Mochi, R Rajeev, S Fernandez, Y Ekinci
Advanced Optical Technologies 6 (6), 439-448, 2017
52017
A comparative study of EUV absorber materials using lensless actinic imaging of EUV photomasks
S Fernandez, D Kazazis, R Rajeev, I Mochi, P Helfenstein, S Yoshitake, ...
Extreme Ultraviolet (EUV) Lithography IX 10583, 105831H, 2018
42018
Scanning coherent diffractive imaging methods for actinic EUV mask metrology
P Helfenstein, I Mohacsi, R Rajendran, Y Ekinci
Extreme Ultraviolet (EUV) Lithography VII 9776, 97761F, 2016
42016
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Articles 1–20