Sledovat
Shahid Rauf
Název
Citace
Citace
Rok
The 2017 Plasma Roadmap: Low temperature plasma science and technology
I Adamovich, SD Baalrud, A Bogaerts, PJ Bruggeman, M Cappelli, ...
Journal of Physics D: Applied Physics 50 (32), 323001, 2017
9822017
The 2012 plasma roadmap
S Samukawa, M Hori, S Rauf, K Tachibana, P Bruggeman, G Kroesen, ...
Journal of Physics D: Applied Physics 45 (25), 253001, 2012
8022012
Dual mode inductively coupled plasma reactor with adjustable phase coil assembly
S Banna, VN Todorow, KS Collins, A Nguyen, MJ Salinas, Z Chen, ...
US Patent App. 12/821,636, 2011
5052011
Etch method in the manufacture of an integrated circuit
TG Sparks, R Shahid
US Patent App. 12/377,348, 2011
4462011
Symmetric plasma process chamber
JD Carducci, H Tavassoli, A Balakrishna, Z Chen, A Nguyen, ...
US Patent 9,741,546, 2017
3532017
Gas distribution plate with annular plenum having a sloped ceiling for uniform distribution
K Bera, S Rauf
US Patent App. 12/004,448, 2009
3432009
Process for wafer backside polymer removal and wafer front side photoresist removal
KS Collins, H Hanawa, A Nguyen, S Rauf, A Balakrishna, VN Todorow, ...
US Patent 7,967,996, 2011
3152011
Dynamics of a coplanar-electrode plasma display panel cell. I. Basic operation
S Rauf, MJ Kushner
Journal of applied physics 85 (7), 3460-3469, 1999
3101999
Inductively coupled plasma source with symmetrical RF feed
JA Kenney, JD Carducci, KS Collins, R Fovell, K Ramaswamy, S Rauf
US Patent 9,928,987, 2018
3032018
Multiple coil inductively coupled plasma source with offset frequencies and double-walled shielding
JA Kenney, JD Carducci, KS Collins, R Fovell, K Ramaswamy, S Rauf
US Patent 10,170,279, 2019
2612019
Fast atomic layer etch process using an electron beam
A Agarwal, S Rauf, K Ramaswamy
US Patent 9,362,131, 2016
2612016
Plasma reactor gas distribution plate with radially distributed path splitting manifold
K Bera, S Rauf
US Patent 8,512,509, 2013
2382013
Independent control of RF phases of separate coils of an inductively coupled plasma reactor
KS Collins, S Kobayashi, L Wong, J Liu, Y Yang, K Ramaswamy, S Rauf
US Patent 9,161,428, 2015
2342015
Argon metastable densities in radio frequency Ar, and electrical discharges
S Rauf, MJ Kushner
Journal of applied physics 82 (6), 2805-2813, 1997
2341997
Two-phase operation of plasma chamber by phase locked loop
S Kobayashi, L Wong, J Liu, Y Yang, K Ramaswamy, S Rauf, SC Nevil, ...
US Patent App. 13/632,302, 2013
2002013
Feol low-k spacers
KS Collins, K Ramaswamy, Y Zhang, H Chang, L Dorf, MF Wu, S Rauf
US Patent App. 14/323,855, 2016
1692016
Pulsed plasma high aspect ratio dielectric process
A Agarwal, KS Collins, S Rauf, K Ramaswamy, TB Lill
US Patent 8,382,999, 2013
1552013
Nonlinear dynamics of radio frequency plasma processing reactors powered by multifrequency sources
S Rauf, MJ Kushner
IEEE Transactions on Plasma Science 27 (5), 1329-1338, 1999
1511999
Synchronized radio frequency pulsing for plasma etching
B Liao, K Kawasaki, Y Pattar, SF Shoji, DD Nguyen, K Ramaswamy, ...
US Patent 8,962,488, 2015
1442015
Workpiece support for a plasma reactor with controlled apportionment of rf power to a process kit ring
KS Collins, DA Buchberger Jr, K Ramaswamy, S Rauf, H Hanawa, JY Sun, ...
1282010
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Články 1–20